Preparation of barium titanate hollow particle by two-step chemical solution deposition
نویسندگان
چکیده
منابع مشابه
Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition
Bismuth titanate (Bi,Ti,O,, :BIT) thin films were prepared on the Pt courted MgO(100) substrate by electron cyclotron resonance plasma sputtering-chemical vapor deposition (ECR plasma sputtering-CVD). Bi20, was used as a sputtering target and tetra-isopropoxy-titanium [Ti(i-C3H70)4] as a CVD source. The composition of films was controlled by changing RF power (P,,) of Bi,O, target and Ti source...
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ژورنال
عنوان ژورنال: Journal of the Ceramic Society of Japan
سال: 2013
ISSN: 1882-0743,1348-6535
DOI: 10.2109/jcersj2.121.80